Surface analytical characterization of oxide-free Si(100) wafer surfaces
- 1 January 1989
- journal article
- research article
- Published by Springer Nature in Analytical and Bioanalytical Chemistry
- Vol. 333 (4) , 527-530
- https://doi.org/10.1007/bf00572370
Abstract
No abstract availableKeywords
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- Studies of the Si/SiO2 interface by angular dependent X-ray photoelectron spectroscopyPhysica Status Solidi (a), 1981
- X-Ray Photoelectron Spectroscopy of SiO2-Si Interfacial Regions: Ultrathin Oxide FilmsIBM Journal of Research and Development, 1978