Characterization of TiN films prepared by a conventional magnetron sputtering system: influence of nitrogen flow percentage and electrical properties
- 1 October 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 287 (1-2) , 115-119
- https://doi.org/10.1016/s0040-6090(96)08749-4
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
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