The effects of substrate bias on the structural and electrical properties of TiN films prepared by reactive r.f. sputtering
- 1 July 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 70 (1) , 17-25
- https://doi.org/10.1016/0040-6090(80)90407-1
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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