Mask Technology For X-Ray Nanolithography
- 1 January 1993
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Fabrication and characterization of high-flatness mesa-etched silicon nitride x-ray masksJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- A compact, low-cost system for sub-100 nm x-ray lithographyJournal of Vacuum Science & Technology B, 1990