Transport and Recombination Channels in Undoped Microcrystalline Silicon Studied by ESR and EDMR
- 1 January 1997
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
We present a detailed study of ESR and spin-dependent transport (EDMR) on μc-Si. We identify to different types of defects at g=2.0055(±3) and g=2.0044(±5) and study their influence on transport and recombination by stepwise annealing the samples. We find that transport is not controlled by defects if ND1018cm−3 a dramatic decrease of the conductivity is found and we identify a hopping contribution in transport. To explain our ESR and EDMR results we propose a simple model where most defects are distributed at the surface of the columns and transport is along percolation paths. We also observe minor metastable changes of the defect density which are assigned to adsorption of atmospheric oxygen.Keywords
This publication has 10 references indexed in Scilit:
- Device grade microcrystalline silicon owing to reduced oxygen contaminationApplied Physics Letters, 1996
- Free electrons and defects in microcrystalline silicon studied by electron spin resonancePhilosophical Magazine Letters, 1994
- Annealing studies of the microcrystalline silicon systemJournal of Non-Crystalline Solids, 1993
- Microwave-induced resonant changes in transport and recombination in hydrogenated amorphous siliconPhilosophical Magazine Part B, 1992
- Hydrogenated Amorphous SiliconPublished by Cambridge University Press (CUP) ,1991
- Properties of microcrystalline silicon. IV. Electrical conductivity, electron spin resonance and the effect of gas adsorptionJournal of Physics C: Solid State Physics, 1983
- ESR and electrical properties of P-doped microcrystalline SiPhilosophical Magazine Part B, 1983
- Recombination processes in-Si:H: Spin-dependent photoconductivityPhysical Review B, 1983
- Conductivity Change Due to Electron Spin Resonance in Amorphous Si-Au SystemJournal of the Physics Society Japan, 1981
- Interface states and electron spin resonance centers in thermally oxidized (111) and (100) silicon wafersJournal of Applied Physics, 1981