Characterization of low pressure chemically vapor-deposited tungsten nitride films
- 1 December 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 236 (1-2) , 330-333
- https://doi.org/10.1016/0040-6090(93)90691-h
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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