Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode
- 1 January 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 111 (3) , 259-268
- https://doi.org/10.1016/0040-6090(84)90147-0
Abstract
No abstract availableKeywords
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