Reactive ion etching of multilayer mirrors for X-ray projection lithography masks
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 283-286
- https://doi.org/10.1016/0167-9317(91)90094-t
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- X-ray lithography, where it is now, and where it is goingJournal of Electronic Materials, 1990
- Soft x-ray reduction lithography using multilayer mirrorsJournal of Vacuum Science & Technology B, 1989
- Reflection mask technology for x-ray projection lithographyJournal of Vacuum Science & Technology B, 1989
- Soft x-ray projection lithography using an x-ray reduction cameraJournal of Vacuum Science & Technology B, 1988