Improvements of electrical and optical properties of InAlAs grown by molecular beam epitaxy

Abstract
Great improvement in the electrical and optical properties of molecular‐beam‐epitaxy‐grown InAlAs was obtained by using InP buffer layers and high substrate temperatures of 555 °C. Undoped InAlAs layers are n type and the highest room temperature electron mobility is as high as 5100 cm2/V s with a carrier concentration of 1×1015 cm3. The room‐temperature photoluminescence spectrum has a sharp edge emission with a spectral half‐width as narrow as 42 meV.