Constructing a reliable neural network model for a plasma etching process using limited experimental data
- 1 January 1994
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Semiconductor Manufacturing
- Vol. 7 (3) , 333-344
- https://doi.org/10.1109/66.311337
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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