Efficiency of the SiH4 oxidation reaction in chemical vapour deposition of SiO2 films at low temperature
- 1 April 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 102 (4) , 361-366
- https://doi.org/10.1016/0040-6090(83)90052-4
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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