Electron beam lithography of Moiré patterns
- 31 August 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 56 (3-4) , 233-239
- https://doi.org/10.1016/s0167-9317(00)00418-4
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Investigation of the surface morphology of thermally evaporated thin gold films on mica, glass, silicon and calcium fluoride substrates by scanning tunneling microscopyThin Solid Films, 2000
- Technology for nanoelectronic devices based on ultra-high vacuum scanning tunneling microscopy on the Si(100) surfaceMicroelectronic Engineering, 1999
- Nano-lithography by electron exposure using an Atomic Force MicroscopeMicroelectronic Engineering, 1999
- Ultrahigh density data storage from local polymerization by a scanning tunneling microscopeApplied Physics Letters, 1998
- Fabrication of metallic nanowires with a scanning tunneling microscopeApplied Physics Letters, 1995
- Submicrometer lithographic patterning of thin gold films with a scanning tunneling microscopeApplied Physics Letters, 1993
- Fabrication of nanometer structures using STMApplied Surface Science, 1992
- Lift-off metallization using poly(methyl methacrylate) exposed with a scanning tunneling microscopeJournal of Vacuum Science & Technology B, 1988