The role of metastable atoms in argon-diluted silane radiofrequency plasmas
Open Access
- 14 July 1994
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 27 (7) , 1406-1411
- https://doi.org/10.1088/0022-3727/27/7/011
Abstract
No abstract availableKeywords
This publication has 25 references indexed in Scilit:
- The axial distributions of optical emission and metastable density: comparison between experiments with DC and RF helium glow dischargesJournal of Physics D: Applied Physics, 1992
- Microstructure, Optoelectronic Properties and Saturated Defect Density of A-SL:H Prepared in VHF-Glow Discharge Using AR and XE DilutionMRS Proceedings, 1992
- Preparation of stable and photoconductive hydrogenated amorphous silicon from a Xe-diluted silane plasmaApplied Physics Letters, 1991
- Nonlinear excitation and dissociation kinetics in discharges through mixtures of rare and attaching gasesJournal of Applied Physics, 1988
- Effects of low-frequency modulation on rf discharge chemical vapor depositionApplied Physics Letters, 1988
- Quenching rates of Ar metastables in radio-frequency glow dischargesJournal of Applied Physics, 1988
- Populations in the metastable and the resonance levels of argon and stepwise ionization effects in a low-pressure argon positive columnJournal of Applied Physics, 1985
- A study of hydrogenated amorphous silicon deposited by rf glow discharge in silane-hydrogen mixturesJournal of Applied Physics, 1984
- Effects of inert gas dilution of silane on plasma-deposited a-Si:H filmsApplied Physics Letters, 1981
- Metastable atom density measurements in He and Ne positive column plasmas by an improved self-absorption methodJournal of Physics D: Applied Physics, 1980