Analytical scanning electron microscopy for solid surface
- 1 July 1989
- journal article
- Published by Wiley in Journal of Electron Microscopy Technique
- Vol. 12 (3) , 219-227
- https://doi.org/10.1002/jemt.1060120305
Abstract
A scanning electron microscope of ultra‐high‐vacuum (UHV‐SEM) with a field emission gun (FEG) is operated at the primary electron energies of from 100 eV to 3 keV. The instrument can form the images that contain information on surface chemical composition, chemical bonding state (electronic structure), and surface crystal structure in a microscopic resolution of several hundred angstroms (Å) using the techniques of scanning Auger electron microscope, scanning electron energy loss microscope, and scanning low‐energy electron diffraction (LEED) microscope. A scanning tunneling microscope (STM) also has been combined with the SEM in order to obtain the atomic resolution for the solid surface. The instrumentation and examples of their applications are presented both for scanning LEED microscopy and STM.Keywords
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