The use of plasmas to deposit and etch materials
- 1 November 1983
- journal article
- Published by IOP Publishing in Physics in Technology
- Vol. 14 (6) , 283-289
- https://doi.org/10.1088/0305-4624/14/6/i02
Abstract
No abstract availableKeywords
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- Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etchingJournal of Applied Physics, 1979