A statistical model of sputtering
- 1 August 1979
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 50 (8) , 5492-5499
- https://doi.org/10.1063/1.326603
Abstract
An elementary statistical model of sputtering based on simple geometrical considerations is described. A useful equation for relative sputtering yields is derived which accurately predicts variations with ion energy, mass, and incident angle over a broad range of these parameters. An empirical relation for the absolute sputtering yields is also deduced. Several comparisons are made to experimental and theoretical work in the literature.This publication has 13 references indexed in Scilit:
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