Deposition of copper oxide films by reactive laser ablation of copper formate in an r.f. oxygen plasma ambient
- 1 February 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 239 (1) , 8-15
- https://doi.org/10.1016/0040-6090(94)90101-5
Abstract
No abstract availableKeywords
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