Surface orientation effect on photoelectrochemical etching in n-type InP
- 31 July 1988
- journal article
- Published by Elsevier in Materials Letters
- Vol. 6 (11) , 433-435
- https://doi.org/10.1016/0167-577x(88)90046-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- The chemical polishing of semiconductorsJournal of Materials Science, 1975
- Characteristics of the {111} Surfaces of the III–V Intermetallic CompoundsJournal of the Electrochemical Society, 1960