Electrical properties and structural defects of Ni-Cr thin films
- 1 May 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 139 (1) , 15-24
- https://doi.org/10.1016/0040-6090(86)90043-x
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- The electrical and compositional structure of thin Ni-Cr filmsThin Solid Films, 1979
- Reactive Sputtering of NiCr Resistors With Closely AdjustableTemperature Coefficient of ResistanceActive and Passive Electronic Components, 1977
- The evaluation of the technology for depositing NiCr resistive filmsThin Solid Films, 1976
- Electrical and structural properties of NiCr thin film resistors reactively sputtered in O2Thin Solid Films, 1974
- Structural and electrical properties of chromium and nickel films evaporated in the presence of oxygenThin Solid Films, 1974
- Structural and electrical properties of evaporated Cr-Ni films as a function of gas pressureThin Solid Films, 1973
- Variation of nichrome film resistance during depositionThin Solid Films, 1972
- Some characteristic properties of NiCr thin filmsThin Solid Films, 1972
- The ageing of thin films of nickel, cobalt and nickel-cobalt alloys in ultrahigh vacuumThin Solid Films, 1971
- The effect of composition on the temperature coefficient of resistance of NiCr filmsBritish Journal of Applied Physics, 1965