Role of plasma-aided manufacturing in semiconductor fabrication
- 1 December 1998
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 26 (6) , 1610-1620
- https://doi.org/10.1109/27.747878
Abstract
A brief review is presented of the application of plasma-aided manufacturing to semiconductor fabrication. Emphasis is placed on current state-of-the-art techniques for which plasma physics plays a significant role and on current problems that remain to be solved.Keywords
This publication has 66 references indexed in Scilit:
- Azimuthally symmetric pseudosurface and helicon wave propagation in an inductively coupled plasma at low magnetic fieldPhysics of Plasmas, 1998
- Electron irradiance of conductive sidewalls: A determining factor for pattern-dependent chargingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Spatially Averaged (Global) Model of Time Modulated High Density Chlorine PlasmasJapanese Journal of Applied Physics, 1997
- Plasma-parameter dependence of thin-oxide damage from wafer charging during electron-cyclotron-resonance plasma processingIEEE Transactions on Semiconductor Manufacturing, 1997
- Charge accumulation effects on profile distortion in ECR plasma etchingPlasma Sources Science and Technology, 1996
- Notching as an example of charging in uniform high density plasmasJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Helicon plasma source excited by a flat spiral coilJournal of Vacuum Science & Technology A, 1995
- Profile Control of poly-Si Etching in Electron Cyclotron Resonance PlasmaJapanese Journal of Applied Physics, 1995
- Charging, transport and heating of particles in radiofrequency and electron cyclotron resonance plasmasPlasma Sources Science and Technology, 1994
- Pulse-time-modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and notch-free polycrystalline silicon patterningApplied Physics Letters, 1994