Stress evolution of Ni/Pd/Si reaction system under isochronal annealing
- 1 April 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 365 (1) , 72-76
- https://doi.org/10.1016/s0040-6090(00)00648-9
Abstract
No abstract availableKeywords
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