Measurement of stress in nickel oxide layers by diffraction of synchrotron radiation
- 1 January 1991
- journal article
- research article
- Published by Springer Nature in Journal of Materials Science
- Vol. 26 (9) , 2300-2304
- https://doi.org/10.1007/bf01130172
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- A two-circle powder diffractometer for synchrotron radiation with a closed loop encoder feedback systemJournal of Applied Crystallography, 1990
- Advantages of synchrotron radiation for polycrystalline diffractometryZeitschrift für Kristallographie, 1987
- The accuracy of stress measurement using the X-ray diffraction methodJournal of Applied Crystallography, 1986
- Determination of the stress level in growing NiO films by X-ray diffractionScripta Metallurgica, 1983
- Effect of gradients in multi-axial stress states on residual stress measurements with x-raysMetallurgical Transactions A, 1983
- Lattice parameter, microstrains and non-stoichiometry in NiO. Comparison between mosaic microcrystals and quasi-perfect single microcrystalsJournal of Applied Crystallography, 1979
- High temperature deformation of polycrystalline NiO and CoOActa Metallurgica, 1977
- Elastic moduli of pressure-sintered nickel oxideJournal of Geophysical Research, 1971
- Crystallography and Domain Walls in Antiferromagnetic NiO CrystalsJournal of Applied Physics, 1960