Submicron structuring of YBa2Cu3O7 thin films with electron beam lithography
- 1 October 1990
- journal article
- letter
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 68 (7) , 3778-3779
- https://doi.org/10.1063/1.346303
Abstract
Thin films of high‐temperature superconducting YBaCuO deposited by dc‐sputtering on SrTiO3 substrates are structured by electron beam lithography on a submicron scale. Details of the technology processes involved are presented. The sudden transition of structures below 1 μm into the semiconducting state is discussed.This publication has 10 references indexed in Scilit:
- Epitaxial multilayers of YBa2Cu3O7 and PrBa2Cu3O7 as a possible basis for superconducting electronic devicesSolid State Communications, 1989
- High-resolution patterning of high T c superconductorsApplied Physics Letters, 1989
- Direct production and properties of sputtered epitaxial YBa2Cu3O7 thin and ultrathin films on (100) and (110) SrTiO3Journal of the Less Common Metals, 1989
- A Novel Real-Time Chirp Measurement Method for Ultrashort Optical PulsesJapanese Journal of Applied Physics, 1988
- Y-Ba-Cu Oxide Thin Films Prepared by DC Magnetron SputteringJapanese Journal of Applied Physics, 1988
- The Impact of High-Temperature Superconductivity on SQUID MagnetometersScience, 1988
- Use of electron beam lithography to selectively decompose metalorganics into patterned thin-film superconductorsApplied Physics Letters, 1988
- Direct Laser Beam Writing on YBaCuO Film for Superconducting Microelectronic DevicesJapanese Journal of Applied Physics, 1988
- Direct production of crystalline superconducting thin films of YBa2Cu3O7 by high-pressure oxygen sputteringSolid State Communications, 1988
- Chemical etching of Y-Cu-Ba-O thin filmsApplied Physics Letters, 1988