Damage production and annealing of ion implanted silicon carbide
- 1 June 1996
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 113 (1-4) , 239-243
- https://doi.org/10.1016/0168-583x(95)01304-0
Abstract
No abstract availableKeywords
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