Mechanism of ion dechanneling in compound semiconductor superlattices
- 15 March 1982
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 40 (6) , 482-484
- https://doi.org/10.1063/1.93142
Abstract
Computer simulations of channeling have been used to evaluate a model proposed by Saris et al. to explain some of their ion dechanneling measurements in InAs-GaSb superlattices. Their model, which involves slight offsets of atomic rows at each interface, produces much less dechanneling than observed experimentally. However, the simulations show that the observed dechanneling can be produced by much larger offsets which would probably be spread over several atomic layers near each interface.Keywords
This publication has 9 references indexed in Scilit:
- Ion backscattering and channeling study of InAs-GaSb superlatticesApplied Physics Letters, 1980
- Electronic structure of semi-infinite III–V compound semiconductor surfaces and interfaces: Application to InAs/GaSb(110)Journal of Vacuum Science and Technology, 1979
- Studies of defects and surfaces by channelingNuclear Instruments and Methods, 1978
- Channeling analysis of stacking defects in epitaxial Si layersNuclear Instruments and Methods, 1978
- About the dechanneling due to dislocation loopsRadiation Effects, 1978
- Dislocations in vapor-grown compositionally graded (In,Ga)PJournal of Applied Physics, 1975
- Monte Carlo Channeling CalculationsPhysical Review B, 1971
- Spectroscopic Analysis of Cohesive Energies and Heats of Formation of Tetrahedrally Coordinated SemiconductorsPhysical Review B, 1970
- Dechannelling Cylinder of DislocationsPhysica Status Solidi (b), 1968