Direct current-94.92 MHz hybrid plasma magnetron sputtering for fabrication of YBa2Cu3O7−x thin films

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Abstract
YBa2Cu3O7−x thin films have been prepared using a newly designed dc‐94.92 MHz hybrid plasma magnetron sputtering system. The cathode current affected the crystalline orientation of the films as well as the deposition rate. Optical emission spectroscopic studies of this plasma indicate that the intensities of the emission lines from the ions increase with the increasing cathode current. The films showed an excellent crystallinity with the a‐axis being perpendicular to the plane of the substrate; a full width at half‐maximum value of 0.027° was measured for the (200) peak from the rocking curve measurement. The crystallinity of films has reached the level for the first time where the crystallinity essentially depends on the crystallinity of the substrate used.