Boron Doping Profiles and Annealing Behavior of Amorphous Implanted Silicon Layers
- 1 January 1973
- book chapter
- Published by Springer Nature
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Distribution of Boron Implanted SiliconPublished by Springer Nature ,1971
- A New Method for Boron Doping of Silicon by Implantation of BF2-MoleculesPublished by Springer Nature ,1971
- Enhanced Annealing Effects of Boron Implanted Layers in Silicon by Post-Implantation of Silicon IonsPublished by Springer Nature ,1971
- Solid Solubility and Diffusion Coefficients of Boron in SiliconJournal of the Electrochemical Society, 1969
- Theory of an Experiment for Measuring the Mobility and Density of Carriers in the Space-Charge Region of a Semiconductor SurfacePhysical Review B, 1958