Distribution of Boron Implanted Silicon

This publication has 10 references indexed in Scilit:

• The isothermal annealing of boron implanted silicon
  Radiation Effects, 1971
• Simple Bakable Goniometer
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• Diode edge effect on doping-profile measurements
  IEEE Transactions on Electron Devices, 1970
• Titanium-silicon Schottky barrier diodes
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• THE LATTICE LOCATION OF BORON IONS IMPLANTED INTO SILICON
  Applied Physics Letters, 1970
• Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets
  Physical Review B, 1969
• Improved profiles of electrical activity in boron implanted silicon
  Physics Letters A, 1968
• RANGE AND DISTRIBUTION OF IMPLANTED BORON IN SILICON
  Applied Physics Letters, 1968
• On the Measurement of Impurity Atom Distributions in Silicon by the Differential Capacitance Technique
  IBM Journal of Research and Development, 1968
• Channeling of medium-mass ions through silicon
  Canadian Journal of Physics, 1968