R.f. reactive sputtering of zinc oxide films on silicon and SiSiO2TiN substrates
- 31 January 1992
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 30 (1-2) , 123-127
- https://doi.org/10.1016/0924-4247(92)80206-i
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Optical properties of ZnO films deposited by r.f. sputtering on sapphire substratesThin Solid Films, 1989
- Thin-film oxygen sensors made of reactively sputtered ZnOSensors and Actuators, 1989
- Growth and characterization of ZnO films deposited on a monolithic Si3N4-SiO2-Si configurationThin Solid Films, 1989
- Sputtering and chemical vapour deposition of piezoelectric ZnO, AlN and K3Li2Nb5O15 films for optical waveguides and surface acoustic wave devicesThin Solid Films, 1982