Production of mixed metal–gas and pure metal ion beams with an electrodeless rf ion source in the low keV regime
- 1 April 1992
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 63 (4) , 2578-2580
- https://doi.org/10.1063/1.1142895
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- High dose, low energy implantation of nitrogen in silicon, niobium and aluminiumSurface and Coatings Technology, 1991
- Formation of intrinsic oxide layers by ion implantation of silicon and titanium in the low kiloelectronvolt regimeMaterials Science and Engineering: A, 1991
- Electron cyclotron wave resonances and power absorption effects in electrodeless low pressure h.f. plasmas with a superimposed static magnetic fieldPlasma Physics, 1974