High dose, low energy implantation of nitrogen in silicon, niobium and aluminium
- 1 November 1991
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 48 (2) , 97-102
- https://doi.org/10.1016/0257-8972(91)90132-g
Abstract
No abstract availableKeywords
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