Thermal Stability of CoSi2 on Single Crystal and Polycrystalline Silicon
- 1 January 1990
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Implantation of carbon to stabilize TiSi2 during thermal annealingNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Thermal stability of TiSi2 on mono- and polycrystalline siliconJournal of Applied Physics, 1986
- Morphological degradation of TiSi2 on 〈100〉 siliconApplied Physics Letters, 1986
- Formation and thermal stability of CoSi2 on polycrystalline SiJournal of Applied Physics, 1985
- Algorithms for the rapid simulation of Rutherford backscattering spectraNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985