Film thickness distribution in magnetron sputtering
- 1 January 1988
- Vol. 38 (8-10) , 791-794
- https://doi.org/10.1016/0042-207x(88)90465-4
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Crystallographic target effects in magnetron sputteringJournal of Vacuum Science & Technology A, 1987
- Spatial distribution of sputtered atoms from magnetron sourceJournal of Vacuum Science & Technology A, 1987
- Summary Abstract: Step coverage in multiple pass sputter depositionJournal of Vacuum Science & Technology A, 1985
- Step coverage simulation and measurement in a dc planar magnetron sputtering systemJournal of Applied Physics, 1983