Endurance and memory decay of MNOS devices
- 1 July 1976
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 47 (7) , 3182-3191
- https://doi.org/10.1063/1.323114
Abstract
The endurance of MNOS EAROM‐type memory devices toward write/erase cycling is examined using the increase of the memory window decay rate as the criterion. Two decay regimes are identified: a short‐term decay in which the window decays linearly with log time, and a long‐term decay in which the rate is faster than log time. Beyond 104 write/erase cycles the short‐term decay rate increases at a rate of 0.05 V per decade of decay per decade of write/erase cycling per volt of memory window being cycled, at room temperature. Cycling also results in a deeper stored charge centroid in the nitride. Increasing the temperature during writing increases the depth of the stored charge in the nitride at a rate of 1.6±0.3 Å/°C and decreases the short‐term decay rate. The degree of temperature dependence of the short‐term decay rate is a function of the write temperature and the number of accumulated write/erase cycles. The storage time tB at which the long‐term decay commences is found to shift toward shorter times on cycling. These observations can be understood in terms of the back tunneling of stored charge into fast interface states in the short‐term decay region, and activated rearrangement of the stored charge within the nitride in the long‐term decay region.This publication has 9 references indexed in Scilit:
- Potential of alternate dielectrics for single and composite film FET gate applicationsJournal of Electronic Materials, 1975
- Charge transfer properties of mnos structures as influenced by processing parametersJournal of Electronic Materials, 1975
- Charge Storage MISFET Memory DevicesJapanese Journal of Applied Physics, 1974
- Electrical and Irradiation Performance of MNOS ArraysJapanese Journal of Applied Physics, 1974
- Measurements of charge propagation in Si3N4 filmsApplied Physics Letters, 1974
- Direct display of electron back tunneling in MNOS memory capacitorsApplied Physics Letters, 1973
- Discharge of MNOS structuresSolid-State Electronics, 1973
- I-V characteristics of MOS capacitors with polycrystalline silicon field platesJournal of Applied Physics, 1972
- Electrochemical Charging of Thermal SiO2 Films by Injected Electron CurrentsJournal of Applied Physics, 1971