THE INFLUENCE OF CHANNELING ON Cu SINGLE-CRYSTAL SPUTTERING
- 15 April 1966
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 8 (8) , 189-190
- https://doi.org/10.1063/1.1754548
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Sputtering Yields of Single Crystals Bombarded by 1- to 10-keV Ar+ IonsJournal of Applied Physics, 1963
- Angular-Dependent Sputtering of Copper Single CrystalsJournal of Applied Physics, 1963
- Sputtering Experiments with 1- to 5-keV Ar+ IonsJournal of Applied Physics, 1963
- High-Energy SputteringJournal of Applied Physics, 1960