Structure, optical and electrical properties of silicon-rich silicon nitride films
- 1 March 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 32 (2) , 339-342
- https://doi.org/10.1016/0040-6090(76)90327-8
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Properties of Vapor Deposited Silicon Nitride Films with Varying Excess Si ContentJapanese Journal of Applied Physics, 1973
- Poole-Frenkel conduction in amorphous solidsPhilosophical Magazine, 1971
- Electron Spin Resonance in Amorphous Silicon, Germanium, and Silicon CarbidePhysical Review Letters, 1969
- Electrical Characteristics of Silicon Nitride Films Prepared by Silane‐Ammonia ReactionJournal of the Electrochemical Society, 1968
- The structure of amorphous silicon nitride filmsPhysica Status Solidi (b), 1968
- Effect of Electron Radiation on Silicon Nitride Insulated Gate Field Effect TransistorsIEEE Transactions on Nuclear Science, 1967