Conduction-band offset in strained Al0.15Ga0.85As/In0.15Ga0.85As/GaAs pseudomorphic structures
- 20 November 1989
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 55 (21) , 2211-2213
- https://doi.org/10.1063/1.102063
Abstract
We report a first determination of the conduction‐band offset in the strained‐layer Al0.15Ga0.85As/In0.15Ga0.85As/GaAs pseudomorphic structure. Two‐dimensional electron density and its effective mass are independently measured by Shubnikov–de Haas and cyclotron resonance experiments for a series of samples with a range of spacer thickness from 30 to 100 Å. Using a charge transfer model, the conduction‐band offset at the Al0.15Ga0.85As/In0.15Ga0.85As interface is found to be (255±35) meV.Keywords
This publication has 20 references indexed in Scilit:
- Optical studies of InxGa1−xAs/GaAs strained-layer quantum wellsApplied Physics Letters, 1989
- Critical Stresses forStrained-Layer PlasticityPhysical Review Letters, 1987
- Band edge offsets in strained (InGa)As-(AlGa)As heterostructuresSolid State Communications, 1987
- Valence band offset in AlAs/GaAs heterojunctions and the empirical relation for band alignmentJournal of Vacuum Science & Technology B, 1985
- Shallow and deep donors in direct-gap -type grown by molecular-beam epitaxyPhysical Review B, 1984
- Electron energy levels in GaAs-heterojunctionsPhysical Review B, 1984
- Energy-gap discontinuities and effective masses for quantum wellsPhysical Review B, 1984
- Doping considerations for heterojunctionsApplied Physics Letters, 1983
- Quantum States of Confined Carriers in Very Thin -GaAs- HeterostructuresPhysical Review Letters, 1974
- Self-Consistent Results for-Type Si Inversion LayersPhysical Review B, 1972