Laser heating and melting of thin films on low-conductivity substrates

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Abstract
A laser beam, incident on a highly absorbent thin film supported by a poorly conductive substrate, causes that film to heat and melt. The time required to reach the melting point and that required to complete the melting process are calculated as a function of the incident laser flux. The calculations neglect heat losses arising from lateral diffusion, convection, and thermal radiation, but they account for a possible reflectivity change at the melting point. They yield a criterion for the minimal absorbed flux necessary to maintain stable monotonic melting.