Marker Experiments for the moving Species in Silicides During Solid Phase Epitaxy of Evaporated Si

This publication has 13 references indexed in Scilit:

• Marker experiments for diffusion in the silicide during oxidation of PdSi, Pd2Si, CoSi2, and NiSi2 films on 〈Si〉
  Journal of Applied Physics, 1983
• Thermal formation of SiO2 films over NiSi, NiSi2 and CoSi2 via silicide decomposition
  Thin Solid Films, 1983
• Behavior and Influence of Oxygen in Chromium Silicide Formation
  Thin Solid Films, 1983
• Growth kinetics of planar binary diffusion couples: ’’Thin-film case’’ versus ’’bulk cases’’
  Journal of Applied Physics, 1982
• Investigation on TiSi2 thin-film oxidation by radioactive tracer technique
  Applied Physics Letters, 1982
• Metallurgical and electrical properties of chromium silicon interfaces
  Solid-State Electronics, 1980
• The formation of NiSi from Ni2Si studied with a platinum marker
  Thin Solid Films, 1978
• Solid phase epitaxy in silicide-forming systems
  Thin Solid Films, 1977
• Dissociation mechanism for solid-phase epitaxy of silicon in the Si 〈100〉/Pd2Si/Si (amorphous) system
  Applied Physics Letters, 1976
• Implanted noble gas atoms as diffusion markers in silicide formation
  Thin Solid Films, 1975