Study of tantalum-based diffusion barriers between Al and Si
- 31 January 1994
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 37 (1) , 65-69
- https://doi.org/10.1016/0038-1101(94)90106-6
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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