Rapid thermal annealing of ion implanted 6H-SiC by microwave processing
- 1 March 1997
- journal article
- research article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 26 (3) , 144-150
- https://doi.org/10.1007/s11664-997-0141-5
Abstract
No abstract availableKeywords
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- Microwave annealing for low temperature VLSI processingPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1985