Rapid thermal processing with microwave heating
- 1 June 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 246 (1-2) , 151-157
- https://doi.org/10.1016/0040-6090(94)90744-7
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- A uniformity degradation mechanism in rapid thermal chemical vapor depositionApplied Physics Letters, 1992
- Single-wafer integrated semiconductor device processingIEEE Transactions on Electron Devices, 1992
- Temperature Non-Uniformities During Rapid Thermal Processing Of Patterned WafersPublished by SPIE-Intl Soc Optical Eng ,1990
- Thermal And Stress Analysis Of Semiconductor Wafers In A Rapid Thermal Processing OvenPublished by SPIE-Intl Soc Optical Eng ,1990