Growth processes of RF glow discharge deposited a-Si:H and a-Ge:H films
- 1 December 1985
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 77-78, 769-772
- https://doi.org/10.1016/0022-3093(85)90773-2
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Oxidation of plasma-deposited hydrogenated amorphous siliconThin Solid Films, 1985
- Growth of hydrogenated amorphous silicon due to controlled ion bombardment from a pure silane plasmaApplied Physics Letters, 1983
- Fast polarization modulated ellipsometer using a microprocessor system for digital Fourier analysisReview of Scientific Instruments, 1982