Thermal stability of GaN investigated by low-temperature photoluminescence spectroscopy
- 27 December 1993
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 63 (26) , 3625-3627
- https://doi.org/10.1063/1.110069
Abstract
We have studied the thermal behavior of 1-μm-thick GaN films grown by plasma-enhanced molecular beam epitaxy. Samples were annealed at elevated temperatures in a nitrogen environment and were characterized by low-temperature photoluminescence (PL). After GaN samples were annealed at up to 700 °C, the free-exciton transition PL line intensity improved. This PL line intensity degraded when annealing temperatures reached 900 °C. After annealing at 900 °C, GaN samples with inferior crystalline quality exhibited a line at 2.3 eV attributed to point defects and antisite defects.Keywords
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