Study of the effect of the oxygen partial pressure on the properties of rf reactive magnetron sputtered tin-doped indium oxide films
- 1 December 1997
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 120 (3-4) , 243-249
- https://doi.org/10.1016/s0169-4332(97)00224-9
Abstract
No abstract availableKeywords
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