Non-mass analysed ion implantation using microwave ion source
- 1 January 1986
- Vol. 36 (1-3) , 11-14
- https://doi.org/10.1016/0042-207x(86)90260-5
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Oxygen implanter for simoxNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Characteristics of Silicon Solar Cells Fabricated by Non-Mass-Analyzed Ion ImplantationJapanese Journal of Applied Physics, 1982
- C.M.O.S. devices fabricated on buried SiO 2 layers formed by oxygen implantation into siliconElectronics Letters, 1978
- Microwave ion sourceReview of Scientific Instruments, 1977