Vinyl ether formulations for step and flash imprint lithography

Abstract
Acrylates have been used as patterning monomers in step and flash imprint lithography. Vinyl ether formulations have a lower viscosity, faster curing rate, and higher tensile strength than acrylate formulations. However, the lack of commercially available, silicon-containing vinyl ether monomers has required the synthesis of several new vinyl ethers. An ideal monomer has low viscosity and low vapor pressure. The vapor pressure of silicon-containing vinyl ethers was predicted using the Joback-Reid, Lyderson, and Lee-Kesler methods. BVMDSO (1,1,3,3-tetramethyl-1,3-bis(vinyloxymethyl)-disiloxane) has the lowest viscosity of the synthesized silicon-containing vinyl ethers that meet the volatility requirement for a 80 pl dispense volume. The formulation of BVMDSO, CHDVE (cyclohexanedimethanol divinyl ether), and TEGDVE (triethylene glycol divinyl ether) shows good tensile strength and modulus. The formulation of BVMDSO, CHDVE, TEGDVE, and fluorinated acetate can print a 30 nm line because it has a low separation force and high tensile modulus.

This publication has 11 references indexed in Scilit: