Oxygen based electron cyclotron resonance etching of semiconducting homoepitaxial diamond films
- 9 November 1992
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 61 (19) , 2326-2328
- https://doi.org/10.1063/1.108232
Abstract
Oxygen-based electron cyclotron resonance (ECR) plasma etching of boron doped homoepitaxial diamond films with no de bias has been achieved. The process was developed to the point where it can provide a uniform and reproducible etching procedure that yields smooth damage-free etched surfaces. Etch rates attained under these conditions of smooth damage-free etched surfaced were about 86 Å/min.Keywords
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