Kinetics of arsenic activation and clustering in high dose implanted silicon
- 21 April 1986
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 48 (16) , 1090-1092
- https://doi.org/10.1063/1.96607
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Rapid Thermal Annealing in SiMRS Proceedings, 1984
- Kinetics and Mechanisms of Solid Phase Epitaxy and Competitive Processes in SiliconMRS Proceedings, 1984
- Solid solubility of As in Si as determined by ion implantation and cw laser annealingApplied Physics Letters, 1979
- The Diffusion of Ion‐Implanted Arsenic in SiliconJournal of the Electrochemical Society, 1975