Formation of microcrystalline structure in a-Si:H films prepared by RF sputtering
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 823-826
- https://doi.org/10.1016/0022-3093(83)90297-1
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Microstructures and Hydrogen Bonding Environments of a-Si: H Films Prepared by RF Sputtering in Pure HydrogenJapanese Journal of Applied Physics, 1983
- Microstructures and Hydrogen Bonding Environments of Sputter-Deposited a-Si:H FilmsJapanese Journal of Applied Physics, 1982
- Hydrogenated crystalline silicon fabricated at low-substrate temperatures by reactive sputtering in He-H2 atmosphereSolid State Communications, 1981
- Structural interpretation of the vibrational spectra of-Si: H alloysPhysical Review B, 1979